Thin Film Stack Designer

Design arbitrary multilayer thin film coatings with full control over layer count, order, materials, and thickness. Visualize both reflectance and transmittance spectra in real time.

Thin Film Stack Designer

Design multi-layer thin film coatings with arbitrary materials, order, and thickness. Add/remove/reorder layers freely. Supports 20+ materials.

Incident medium:AirSiO₂SiliconGePolymerGlass (BK7)

Substrate:AirSiO₂SiliconGePolymerGlass (BK7)

Preset:CustomBARL 4-layer (default)2-layer AR (MgF₂/TiO₂)Broadband AR (4-layer)HR Blue mirrorNIR-cut filter

Target:Blue (430-470nm)Green (510-560nm)Red (590-640nm)Visible (430-640nm)Full (380-780nm)

Layers (4)top → bottom (light direction)

1SiO₂Si₃N₄HfO₂TiO₂Al₂O₃MgF₂Ta₂O₅ZrO₂Nb₂O₅ZnSZnSeCaF₂ITOAlNSiCGePolymerTungsten

nm

2SiO₂Si₃N₄HfO₂TiO₂Al₂O₃MgF₂Ta₂O₅ZrO₂Nb₂O₅ZnSZnSeCaF₂ITOAlNSiCGePolymerTungsten

nm

3SiO₂Si₃N₄HfO₂TiO₂Al₂O₃MgF₂Ta₂O₅ZrO₂Nb₂O₅ZnSZnSeCaF₂ITOAlNSiCGePolymerTungsten

nm

4SiO₂Si₃N₄HfO₂TiO₂Al₂O₃MgF₂Ta₂O₅ZrO₂Nb₂O₅ZnSZnSeCaF₂ITOAlNSiCGePolymerTungsten

nm

Avg R in band:4.12%

Avg T in band:95.88%

Min R:0.71% @ 560 nm

Total thickness:80 nm

Stack cross-section:

Air

10

25

15

30

Silicon

SiO₂ HfO₂ Si₃N₄

Supported Materials (20+)

Category	Materials
Low-n dielectrics	SiO₂, MgF₂, CaF₂, Al₂O₃
High-n dielectrics	Si₃N₄, HfO₂, TiO₂, Ta₂O₅, ZrO₂, Nb₂O₅, AlN
Semiconductors	Silicon, Ge, SiC, ZnS, ZnSe
Conductors / TCO	Tungsten, ITO
Polymers / Glass	Polymer (n=1.56), BK7 Glass

Built-in Presets

• BARL 4-layer: Default BSI pixel anti-reflection stack (SiO₂/HfO₂/SiO₂/Si₃N₄)
• 2-layer AR: Simple MgF₂/TiO₂ anti-reflection coating
• Broadband AR: 4-layer design for wide spectral coverage
• HR Blue mirror: 6-layer high-reflectance stack for blue wavelengths
• NIR-cut filter: 5-layer near-infrared rejection filter on glass

TIP

Use the "Auto Optimize" button to find thickness combinations that minimize average reflectance in your target wavelength band. You can freely add, remove, and reorder layers before optimizing.